1000-1800℃ Carbon-Carbon & Carbon-Ceramic CVD Furnace
Product Overview
The Cxinduction™ Carbon-Carbon/Carbon-Ceramic CVD Furnace enables precision chemical vapor deposition (CVD) to produce ultra-dense C/C and C/SiC composites for extreme environments. Operating temp customized from 1000-2000℃.
Performance Upgrade Path:
Post-deposition, materials can be treated in our 2500-3000℃ Graphitization Furnace to:
✓ Enhance thermal conductivity by 40-60%
✓ Improve oxidation resistance
✓ Optimize mechanical strength
Key Applications:
Aerospace: Brake discs, rocket nozzles, thermal protection systems
Industrial: Hot press molds, semiconductor fixtures
Energy: Fusion reactor components, battery thermal management
Advantages
✔ Uniform temperature control via multi-zone heating
✔ Optimized gas flow for superior matrix density
✔ Real-time process monitoring
✔ Compatibility: PAN, pitch, and rayon-based preforms
Key Parameters
Heating Rate: Adjustable 1–20°C/min
Optional Vacuum (10⁻² Pa) or Inert Gas (N₂/Ar) for pre/post-treatment
Heating Elements: Graphite resistance heating
Thermal Insulation: Multi-layer C/C or graphite felt for energy efficiency
Precision mass flow controllers (MFCs) for precursor gases
PLC Control: Real-time monitoring of T, P, gas flow
Data Logging: Records deposition rate, density, and defects
Anti corrosion vacuum unit
Model | CX-CVD100/CC1 | CX-CVD100/CC2 |
Work Zone Size (mm) | 1000×1500mm (φ*D） | 1000*1000*1500（W*H*L） |
Capacity (L) | 1177 | 1500 |
Max Design Temp | 2000℃ | |
Heating Method | Resistance | |
Control Method | Auto & MAN | |
Temp Controller | Shimaden FP93 | |
Vacuum System | Anti pollution pump | |
Vacuum Degree | 1-100Pa | |
Atmosphere | Carbon and hydrogen gases, etc | |
Rated power | Customized | |
Contact us for Advanced Deposition Solution for High-Performance Composites!
