CVD for Carbon Composites

Graphite resistance heating and controlled precursor-gas flow for C/C and C/SiC composite processing. Operating temperature, gas chemistry and preform compatibility require process review.

Applications

• Brake discs, rocket nozzles and thermal protection components
• Hot-press molds and semiconductor fixtures
• Energy-system components and thermal-management materials

Configuration

• Multi-zone heating, mass flow controllers and PLC monitoring of temperature, pressure and gas flow
• C/C or graphite-felt insulation; anti-pollution vacuum pumping
• Listed adjustable heating rate: 1–20°C/min, subject to configuration

Listed chamber options

Listed process parameters

• Maximum design temperature: 2000°C; working temperature to be confirmed for the process
• Process vacuum: 1–100 Pa
• Atmosphere: carbon-containing and hydrogen gases, selected for the deposition chemistry
• Automatic and manual control; Shimaden FP93 temperature controller
• Rated power: customized

Pre/post-treatment atmosphere and vacuum configuration are specified separately. Discuss post-deposition graphitization objectives and validate thermal and mechanical properties for your material.

Request a process configuration

Send preform material, dimensions, batch load, precursor chemistry and deposition targets.