Applications:
EV/Energy: SiC power modules for fast chargers & inverters
Aerospace: Oxidation-resistant coatings for turbine components
Semiconductor: Wafer carriers and diffusion fixtures
Advanced CVD Solutions for SiC Semiconductor Manufacturing
Cxinduction™ presents a 1600℃ Multi-Atmosphere CVD Furnace specifically engineered for high-quality SiC epitaxial growth and advanced material coatings. Our horizontal hot-wall CVD system delivers superior uniformity and repeatability for:
✔ SiC Power Devices: Epitaxial wafers for MOSFETs/Schottky diodes (4H-SiC & 6H-SiC)
✔ High-Temp Components: Coating of crucibles, susceptors, and CMC materials
✔ Wide-Bandgap Semiconductors: BN and doped-SiC deposition
Key System Advantages
Graphite Muffle Design: Ensures contamination-free processing and excellent temperature uniformity (±2℃ at 1600℃)
Precise Process Control:
Multi-gas atmosphere with mass flow controllers
Constant-pressure mode (10-2Pa~100 kPa) for stable epitaxial growth
End Applications:
EV/Energy: SiC power modules for fast chargers & inverters
Aerospace: Oxidation-resistant coatings for turbine components
Semiconductor: Wafer carriers and diffusion fixtures
Parameters:
Model | CX-CVD40/SIC | CX-CVD50/SIC | CX-CVD60/SIC | CX-CVD60I/SIC |
Heating Method | Graphite Resistance | |||
Control Method | Auto & MAN | |||
Max Work Temp | 1600℃ (1800℃ optional) | |||
Rated power | 70KW | 85 KW | 120 KW | 160 KW |
Usable Space (mm) W*H*L | 400×400×1200 | 500×500×1500 | 600×600×1800 | 600×600×2000 |
Max. Loading Capacity (L) | 192L | 375L | 648L | 720L |
Temp Uniformity | ±2℃ (ΔT between 1000C and 2200C) | |||
Max. Heat-up Rate (CEDRT)* | 15℃/min | |||
Ultimate Vacuum (CEDRT)* | 1.2×10-3mbar | |||
Optional High Vacuum (CEDRT)* | 5×10-5mbar | |||
Pressure Rise | 1.33×10-2mbar/hr | |||
Working Atmosphere | Fine Vacuum (Optional) / Vacuum / Inert Gas (Ar or N2) | |||
Supply Voltage | Can be customized | |||
Cooling Water Pressure | 2bar | |||
Cooling water temp | ≤28℃ | |||
Keywords:
SiC epitaxial growth furnace | 1600℃ CVD system for semiconductors | Silicon carbide equipment | Graphite muffle CVD furnace | Chemical deposition furnace